Graph-Based Subfield Scheduling for Electron-Beam Photomask Fabrication
نویسندگان
چکیده
منابع مشابه
Resist Heating Dependence on Subfield Scheduling in 50kV Electron Beam Maskmaking
In high-voltage electron beam lithography, most of the beam energy is released as heat and accumulates in the local area of writing. Excessive heat causes changes in resist sensitivity, which in turn causes significant critical dimension (CD) variation. Previous methods for reducing CD distortion caused by resist heating include usage of lower beam currents, increased delays between electron fl...
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ژورنال
عنوان ژورنال: IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
سال: 2013
ISSN: 0278-0070,1937-4151
DOI: 10.1109/tcad.2013.2237947